Christophe Vallee

Past Professional Experience

• Professor, Laboratory of Microelectronics Laboratory of Microelectronics Technologies (LTM) - Polytech’ Grenoble, Grenoble Alpes University, France, 2010-2020
• Visiting Professor, Graduate school of pure and applied sciences, Tsukuba University, Japan, 2016-2020
• Assistant Professor, Laboratory of Microelectronics Laboratory of Microelectronics Technologies (LTM), Grenoble Alpes University, France, 2001-2010
• Assistant Professor, Laboratory of Electrostatic and Dielectric Materials (LEMD), Grenoble Alpes University, France, 1999-2001

Areas of Research

• Plasma Processing (RIE, PECVD, PVD)
• Atomic Scale processing (ALD, ALE, ASD)
• High k materials for MIM devices (Capacitors, Resistive memories)

Research 

Plasma and Atomic scale processes are mandatory steps for the fabrication of semiconductor devices (CMOS, DRAM…). Those processes are becoming increasingly complex (pulsing plasma, pulsing precursor…), with many parameters to play with, making them more difficult to understand and optimize. Our research focuses on the development and optimization of Plasma Etching (RIE), Plasma Deposition (PECVD), and Atomic Scale Process (Atomic Layer Deposition – ALD, Atomic Layer Etching – ALE, Area Selective Deposition – ASD) for targeting materials or devices. This activity is carried out on 300 mm industrial tools in CNSE cleanroom, thanks to collaborations with local manufacturers such as TEL, as well as on smaller laboratory equipment. Using in situ and ex situ diagnostics we try to understand plasma/surface or precursor/surface reactions and build innovative strategies for the next generation of plasma/atomic scale processes.

Example of current topics of research

Plasma etching of metal nitride materials, Low temperature plasma etching of low k materials, Impact of by-products in HAR plasma etching, Characterization of Small Molecule Inhibitors for Area Selective Deposition, Area Selective deposition on EUV resists.